91³ÉÈ˰涶Òô

UNSW Photonics and Optical Communications Group has access to a wide range of state-of-the art facilities for advanced research in Photonics. Our facilities underpin key cross-disciplinary and interdisciplinary photonics research spanning chemistry, physics and engineering across Australia and globally.Ìý
Ìý

Joint NationalÌýFibreÌýFacilityÌý

ÌýThe Joint NationalÌýFibreÌýFacility at UNSWÌýis the latest state-of-the-art silicaÌýfibreÌýfabrication facility, built on the combined experience of opticalÌýfibreÌýresearch based across NSW. It’s supported by Australian Research Council and nine Australian University partners including:Ìý

  • The University of New South Wales (UNSW)ÌýÌý
  • The University of SydneyÌýÌý
  • The University of MelbourneÌýÌý
  • Macquarie UniversityÌýÌý
  • Victoria University of TechnologyÌý
  • Wollongong UniversityÌýÌý
  • Swinburne University of TechnologyÌý
  • The University of NewcastleÌýÌý
  • The University of Southern QueenslandÌý

It is dedicated to the production of research grade silicaÌýfibresÌýand enhancing the pioneering work in Australian opticalÌýfibreÌýresearch, pioneered at UNSW, over many decades. It includes on-site MCVD fabrication, the tallest research intensive draw tower in the Southern HemisphereÌýand extensiveÌýcharacterisationÌýequipment including a new performÌýanalyser. Through its partners, a comprehensive and completeÌýcharacterisationÌýprocess for all opticalÌýfibresÌýexists.Ìý

For more information, contactÌýProf. Gang-Ding Peng.Ìý

OtherÌýfacilitiesÌý

Our researchers have access to:Ìý

  • MCVDÌýFacility:Ìýrecently undergone aÌýmajor upgradeÌýwith a new in Heathway MCVD control system and lathe installationÌý
  • PolymerÌýfiberÌýfabrication facility:Ìýthis includes material processing systems,ÌýpolymerisationÌýsystems,ÌýfiberÌýdrawing rigÌý
  • Advanced Planar Waveguide Fabrication facility: The laboratory has an advanced planar waveguide fabrication facility based on Hollow Cathode Plasma Enhanced ChemicalÌýVapourÌýDeposition (HC-PECVD) and Hollow Cathode - Reactive Ion Etch (HC-RIE) systemsÌýÌý
  • Silica Fiber Grating and Fiber Laser Fabrication System: an industrial standard facility forÌýfiberÌýBragg grating inscription using UVÌýArÌýion laser. Using this facility high standard Bragg gratings can be inscribed in silica fibers.Ìý
  • Polymer Fiber Grating Fabrication Facility:Ìýthis lab is home to a high power He-Cd laser, Phase masks and modifiedÌýSagnacÌýinterferometric Bragg grating setup for grating inscriptionÌý
  • UV-IR Tunable Laser MOPOÌý
  • PreformÌýAnalyserÌýSystemÌý
  • Various photonics and optical test andÌýcharacterisationÌýsystemsÌý